TRI-T-BUTOXYSILANOL
Synonym(s):TBS
- CAS NO.：18166-43-3
- Empirical Formula: C12H28O4Si
- Molecular Weight: 264.43
- MDL number: MFCD00271024
- SAFETY DATA SHEET (SDS)
- Update Date: 2026-01-13 11:21:02
What is TRI-T-BUTOXYSILANOL?
The Uses of TRI-T-BUTOXYSILANOL
Tris(tert-alkoxy)silanols reacts with tetrakis(dimethylamino)-hafnium vapor(Hf(N(CH3)2)4) for vapor phase deposition of hafnium silicate glass films. Tris(tert-butoxy)silanol is used for atomic layer deposition (ALD) of highly conformal layers of amorphous silicon dioxide and aluminum oxide nanolaminates.
The Uses of TRI-T-BUTOXYSILANOL
Precursors Packaged for Depositions Systems
General Description
Tris(tert-butoxy)silanol can react with various metal alkyl amides to act as precursors for vapor deposition metal silicates. It also acts as a suitable precursor for deposition of silica.
Properties of TRI-T-BUTOXYSILANOL
| Melting point: | 63-65 °C(lit.) |
| Boiling point: | 205-210 °C(lit.) |
| Density | 0,92 g/cm3 |
| Flash point: | >65°C |
| storage temp. | Inert atmosphere,Room Temperature |
| form | solid |
| pka | 11.78±0.53(Predicted) |
| Hydrolytic Sensitivity | 7: reacts slowly with moisture/water |
| Sensitive | moisture sensitive |
Safety information for TRI-T-BUTOXYSILANOL
Computed Descriptors for TRI-T-BUTOXYSILANOL
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