Indium phosphide

The Uses of Indium phosphide

Electronic grade in semiconductor devices, injection lasers, and experimental solar cells.

The Uses of Indium phosphide

It is used as the substrate for the low pass interference filter utilizing the steep rise in the transmittance at λ: 0.96 mm.

Definition

A brittle metallic mass, mp 1070C, slightly soluble in mineral acids.

Production Methods

In the case of synthesizing a single crystal by mixing In and P stoichiometrically, it needs to devise the structure of the furnace. A long quartz tube encapsuled with InP is put into the horizontal two zones furnace and the first zone is controlled at 530℃–550℃ to keep the vapor pressure of P at 15–20 atm. The second zone is heated at 1100℃ to melt InP. A single crystal is grown by decreasing the temperature of the first zone slowly.
In the case of depositing a thin film by the vapor phase method, InP and I2 or Cl2 are enclosed in the quartz tube and the InP vapor is transported to the low temperature zone by I2 or Cl2 gas. Epitaxial films are grown by this method.

Hazard

Probable carcinogen. See indium.

Structure and conformation

The space lattice of InP belongs to the cubic system, and its zinc blend structure has a lattice constant of a=0.58688 nm and In–P=0.254 nm.