Cetirizine 3-Chloro IMpurity Dihydrochloride
| Price | USD0.01 |
| Packge | 1KG |
- Min. Order:1KG
- Supply Ability:1kg; 5kg; 10kg
- Time:2021-01-06
Product Details
- Product NameCetirizine 3-Chloro IMpurity Dihydrochloride
- CAS No.1232460-29-5
- EINECS No.604-604-1
- MFC21H26Cl2N2O3
- MW425.35
- AppearanceSolidWhite to Off-White
- Melting point 157-162oC
- storage temp. Hygroscopic, -20°C Freezer, Under inert atmosphere
| Product Name: | Cetirizine 3-Chloro IMpurity Dihydrochloride |
| Synonyms: | Cetirizine 3-Chloro IMpurity Dihydrochloride;2-(2-(4-((3-chlorophenyl)(phenyl)methyl)piperazin-1-yl)ethoxy) acetic acid hydrochloride salt;Cetirizine-4;CETIRIZINE-4;Cetirizine Impurity 26;2-[2-[4-[(3-Chlorophenyl)phenylMethyl]-1-piperazinyl]ethoxy]acetic Acid Hydrochloride;Cetirizine 3-chloro IMpurity;(RS)-2-[2-[4-[(3-Chlorophenyl)phenylmethyl]piperazin-1-yl]ethoxy] acetic acid dihydrochloride |
| CAS: | 1232460-29-5 |
| MF: | C21H25ClN2O3 |
| MW: | 388.8878 |
| EINECS: | |
| Product Categories: | Aromatics;Heterocycles;Impurities;Intermediates & Fine Chemicals;Pharmaceuticals |
| Mol File: | 1232460-29-5.mol |
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| Cetirizine 3-Chloro IMpurity Dihydrochloride Chemical Properties |
| Safety Information |
| Cetirizine 3-Chloro IMpurity Dihydrochloride Usage And Synthesis |
| Uses | Cetirizine (C281100) impurity as histamine inhibitor |
Company Profile Introduction
Technology research and transfer of pilot screening, pilot scale-up and mass production solutions , for pharmaceutical intermediates, biologicals and fine chemicals (Not including inflammable , explosive , hazardous goods ) ; Market : Nano material , metal catalyst , raw material of cosmetics , pharmaceutical intermediates , chemicals , photoelectric material , import and export of technology and goods (For projects subject to approval according to law, business activities can be carried out only after approval by relevant departments ).
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- Since:2020-12-17
- Address: Room 702, Floor 7, Building 10, National University Science Park, High-Tech Zone, Zhengzhou City, He
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